The TFD program provides a week-long forum for academic, government, and industrial researchers and practitioners to share new advances in the processing, structure, properties, and applications of thin films. Topics span from the fundamental science of thin film processing and characterization to the scale-up and commercialization of thin film deposition equipment and devices. Early in the week, TF sessions highlight fundamental scientific advances in controlling crystalline phases in thin films and advances in thin film technology for energy applications. Mid-week, the TF program hosts several sessions on the vapor deposition of organic, polymeric, and hybrid materials. At the end of the week, TF sessions focus on the use of thin films in microelectronics, including advances in ferroelectric and wide-bandgap thin films. The TF poster session on Thursday evening will span all these topical areas. Joint programming on atomic layer processing can be found early in the week in the Atomic Scale Processing Mini-Symposium, while early to mid-week joint programming on the use of thin films in microelectronics can be found within the Chips Act Mini-Symposium (early) and the Electronic Materials and Photonics Division program (mid).
Finally, on Monday evening, TF will also again host its popular student-focused session in which James Harper Award finalists will share their work in interactive “TED Talk” style presentations.
TF1-MoM: Fundamentals of Thin Films I
- Reduced Oxide Epitaxy at Very High Temperatures, Joseph Falson, Caltech
TF2-MoM: Characterization of Thin Films
- Mapping Nanoscale Polarity Using Scanning Nanobeam Electron Diffraction Techniques, Megan Holtz, Colorado School of Mines
TF1-MoA: Thin Films for Energy I
- Enabling Scalable Sustainable Energy Devices via Spatial Atomic Layer Deposition, Paul Poodt, SparkNano and Eindhoven University of Technology, Netherlands
- Vapor Phase Methods for Tailoring Electrode−Electrolyte Interfaces in Lithium-Ion Batteries, Reeja Jayan, Carnegie Mellon University
- Manufacturing-Scale Powder Atomic Layer Deposition for Battery Applications, Arrelaine Dameron, Forge Nano Inc
TF2-MoA: Thin Films for Energy II
- Interface Engineering for the Highly Efficient Antimony Chalcogenides Thin Film Energy Devices, Feng Yan, Arizona State University
TF1+EM-TuM: Thin Films for Energy III
- Atomic Layer Deposition of Metal Iodides, Marianna Kemell, University of Helsinki, Finland
TF2-TuM: VSHOP I – Porous Framework Materials & Membranes
- Synthesis of Electrically Conductive Metal-Organic Framework Thin Films, Sarah Park, Pohang University of Science and Technology (POSTECH), Republic of Korea
TF-TuA: VSHOP II – Infiltration Synthesis of Hybrid Materials
- Ruthenium Tetroxide as a Versatile and Selective Precursor for Sequential Infiltration Synthesis of Ru and RuO2 Jolien Dendooven, Ghent University, Belgium
- Functionalization of Polymer Membranes for Water Treatment using Chemical Vapors, Jeffrey Elam, Argonne National Laboratory
TF1-WeM: VSHOP III – Initiated Chemical Vapor Deposition
- Vapor-Phase Deposited Functional Polymer Films for Electronics and Biomedical Device Applications, Sung Gap Im, KAIST, Korea
- Surface Roughness Control in Vapor-Deposited Nanocoatings for Bio-Adhesion Mitigation, Jessie Yu Mao, Oklahoma State University
TF2-WeM: VSHOP IV – Oxidative Chemical Vapor Deposition & Molecular Layer Deposition
TF-WeA: Fundamentals of Thin Films II
TF+CPS+MS+EM-ThM: Thin Films for Microelectronics I
- Pushing the Limits of Vertical NAND Storage Technology with ALD-based Ferroelectrics, Asif Khan, Georgia Institute of Technology
- Towards Low-Resistance p-Type Contacts to 2D Transition Metal Dichalcogenides Using Plasma-Enhanced Atomic Layer Deposition, Ageeth Bol, University of Michigan, Ann Arbor
- Integrated Magnetoacoustic Isolator with Giant Non-Reciprocity, Nian-Xiang Sun, Northeastern University
TF+CPS+MS+EM-ThA: Thin Films for Microelectronics II
- Area Selective Deposition Processing in the Memory Industry: How to Take Advantage of the High-Volume Manufacturing Environment, Francois Fabreguette, Micron Technology
TF-ThP: Thin Films Poster Session
TF-FrM: Fundamentals of Thin Films III