Chemical and physical processes occurring at surfaces and gas-liquid, solid-liquid, and gas/plasma-solid interfaces are crucial for many applications, and yet their analysis often represents grand scientific and engineering challenges. The CA Focus Topic is designed as a cross-disciplinary “melting pot” and aims to disseminate the latest developments in experimental methods and understanding of the interfacial physical and chemical processes relevant (but not limited) to materials synthesis, device microfabrication, energy/catalysis research, biomedical applications, environmental sciences, and surface modifications, to name a few. In particular, in (ex-) situ/in vivo/operando chemical imaging, microscopy and spectroscopy studies using electron, X-ray, ion, and neutron beams, as well as optical methods and synchrotron radiation/ FEL facilities are strongly encouraged. Attention will also be paid to correlative spectroscopy and microscopy methods, modern image/spectra processing, and AI-enabling data analytics techniques. Contributions are invited, including but not limited to experimental, fundamental research, industrial R&D, novel analytical techniques/approaches, and metrology of realistic surfaces and interfaces.
Areas of Interest: The CA Focus Topic serves as a dynamic, cross-disciplinary forum intended to foster the exchange of cutting-edge research and insights. Its primary goal is to highlight the latest advancements in experimental techniques and the fundamental understanding of interfacial physical and chemical processes. The symposium covers a broad range of applications, including materials synthesis, device microfabrication, energy and catalysis research, biomedical innovations, environmental science, and surface modification technologies and we are seeking abstracts in the following areas:
- In situ and operando characterization of energy surfaces
- AI-assisted modeling and learning applied to interfacial processes characterization and analysis
- Advances in multimodal measurement capabilities in the industry
- Materials and interfaces for next-generation electronics
- Chemical analysis and imaging in harsh environments (radiation, chemical, thermal, plasma)
CA+AS+SS-WeM: Chemical Analysis and Imaging at Interfaces Oral Session
- Henrik Arlinghaus, 1) ION-TOF GmbH, Germany; 2) Institut für Hygiene, WWU, Germany, “ToF-SIMS Acquisition Multiplexing – Concept, Applications, and Data Analysis”
- Hendrik Bluhm, Fritz Haber Institute of the Max Planck Society, Germany, “Heterogeneous Chemistry at Liquid-Vapor Interfaces Investigated by X-Ray Photoelectron Spectroscopy”
- Jinghua Guo, Lawrence Berkeley National Laboratory, “Probing Chemical and Catalytic Interfaces Using Operando Soft X-Ray Spectroscopy”
- Alastair Stacey, Princeton Plasma Physics Laboratory, “Diamond Surface Analysis for Electronics and Quantum Applications”
CA-WeA: Advances in Experimental and Theoretical Insights Into Material Interfaces
- Yue Qi, Brown University, “Probing the Electronic-Ionic-Mechanical Coupling at Solid-Electrolyte/Electrode Interfaces”
CA-ThP: Chemical Analysis and Imaging at Interfaces Poster Session